Optical and structural properties of SiO<inf>x</inf>N<inf>y</inf>H<inf>z</inf> films deposited by electron cyclotron resonance and their correlation with composition
Journal of Applied Physics
- Volumen: 93
- Número: 11
- Fecha: 01 June 2003
- Páginas: 8930-8938
- ISSN: 00218979
- Source Type: Journal
- DOI: 10.1063/1.1566476
- Document Type: Article
The optical and structural properties of SiOxNyHz films, deposited by electron cyclotron resonance, were analyzed. Heavy ion elastic recoil detection analysis was used to measure the absolute concentrations of all the species present in the films. The composition of the films was controlled over the entire composition range by adjusting the precursor gases flow ratio during deposition.